GloFo’s FinFETS are Better than Intel’s! Musings from on the Road..

March 19th, 2012 by Dick James

This confident statement came from Subramani (Subi) Kengeri of GLOBALFOUNDRIES (GloFo) during the panel session in the GloFo/IBM/Samsung Common Platform Technology Forum (CPTF), held Wednesday in the Santa Clara Convention Center. I’m currently on one of my periodic road trips, and this one has given me the chance to sit in on the CPTF – last year I had to make do with the online version.

Towards the end of the panel discussions, the host, Jaga Jagannathan of IBM, asked Subi “How do you stack up against Intel? – especially in the SoC/smartphone space?”

This clearly took Subi by surprise, but after some preamble, he focused on FinFET development, which AMD, then GloFo, have been working on for the last ten years.  In conjunction with customer input, they have been focusing their finFET efforts to optimise the (14 nm) process for mobile SoCs. He said that this was what would differentiate them from Intel, and in that space “We believe we have a much better finFET, that is optimised for mobile SoCs”.

CPFT Panel Session - Jaga on the left, Subi third from the right. Source: Common Platform

Of course time will tell, and the CPTF 14-nm process will likely not show up for three or four years, while we are waiting for Intel’s imminent launch of their trigate product.

The panel session has been put online, so you can see it by going here; register if you need to, then select Agenda and click the relevant link; if you want to see this particular Q & A, move the slider to the 52:30 timepoint.

Also during the discussion Subi stated that GlobalFoundries is in production for 32-nm HKMG, and running the full flow of the 20-nm (gate-last) process in their Malta NY fab.

Earlier in the day he had given one of the keynote talks, and it was then that he gave the logic for the move to finFET at 14-nm that was a major theme of the day.  It boils down to the fact that by the time you get to the 20-nm node, there are no more knobs to turn to crank up the performance of a transistor.  In order to mitigate the short-channel effects and increase drive current, a 3D fully-depleted structure is needed. GloFo regards the mobile sector as one of the big drivers for leading-edge process development these days, so their finFET efforts have been focused in the mobile SoC arena, with a multiple Vt process in development.

Another nugget from the day was the public announcement that Samsung is in full production with their 32-nm HKMG process, and it appears in Austin as well as Korea.  I was hoping that we might see it in the new iPad, but we’ve now confirmed that the A5x chip is 45-nm. I guess we’ll have to wait for one of the new phones or tablets that will be out soon. Actually, that includes TVs too – Samsung had a TV with gesture recognition on the show floor, powered by a 32-nm HKMG processor, and that’s due out next month as well.

The following day I was at an Intel analyst meeting, but that’s under NDA so I can’t say too much; but it’s not letting too much out to say that it reinforced their messages from CES and the Mobile World Congress that there will be a big push on Ultrabooks and mobile phones.  Next month expect a huge marketing campaign for Ultrabooks – it was described as “epic” and “cinematic” at CES. Even now we’re seeing all sorts of product announcements by the OEMs, including plenty with the 22-nm Ivy Bridge chip inside.

At the moment I’m in Shanghai taking in the China Semiconductor Technology International Conference and Semicon China. I’m presenting on “Recent Innovations in Leading-Edge Silicon Devices”; hopefully it will get a good reception. And we’ll see if there’s anything blog-worthy this week. In the meantime I tweet @ChipworksDick if anything is noteworthy.

U.S Patent Litigations Reach All Time High in 2011

March 8th, 2012 by chipworks

Contributed by Terry Ludlow

U.S. litigations hit an all time high of just over 4000 cases in 2011. But why? What events drove this growth?

Chipworks tracks U.S. patent litigations to assess and predict trends in semiconductor and electronics licensing. We do so on a quarterly basis so that we can relate key events in the industry to the peaks and valleys we observe in the number of cases being filed. See Chart 1 below.

Our review of events over the last three or four years leading up to the 2011 growth suggests the following:

  • Not unexpectedly, filings hit a low in the fourth quarter of 2009, reflecting the impact of the Lehman Brothers US bankruptcy filing a year earlier and the full onslaught of the financial crisis.
  • From this low in Q4 2009, filings rose dramatically in 2010, with the biggest uptick observed in the second half of the year. The climb in 2010 can be attributed in part to a significant rise in false marking cases. According to Gray on Claims, false markings accounted for over 700 patent litigations in 2010. Judicial decisions limiting the value of false marking cases and the passage of the Patent Reform bill in Q3 2011 reduced and then eliminated false marking cases from the statistics.
  • Q3 2011 saw a slight increase in litigation filings aided by record setting litigation filings on September 15, the day prior to the signing of the America Invents Act by President Obama, and the elimination of multi-defendant suits. A total of 54 cases were filed that day alone, where the average complaint accused 16 entities of patent infringement (Patently-O).
  • Fourth quarter 2011 saw a peak in filings, with about 1100 new cases being filed in the quarter alone. Non-practicing entities (NPEs), who had routinely filed large multi-defendant cases, took to filing multiple parallel cases against single defendants in the months following the passage of the AIA. See Chart 2.

  • A short term effect of the AIA may in fact be a substantial increase in the raw number of lawsuits filed each month, in particular NPE initiated lawsuits. This early data suggests a 25% – 30% increase. We believe this is really just the impact of the reductions in multi-defendant cases and not a significant increase in new matters. We should see this trend continue, offset by a notable reduction in the average number of defendants per case.

Inside Cree’s SiC Power MOSFET

March 5th, 2012 by Carav

Contributed by: St.J. Dixon-Warren

Cree is the market leader in silicon carbide (SiC) device technology. They sell both material and a variety of discrete devices including LEDs and Schottky diodes. Recently, they launched a silicon carbide power MOSFET device, the CMF20120D, targeted at solar inverters, high voltage DC/DC converters, and motor drives. According to the datasheet, the CMF20120D is rated for VDS up to 1200 V with RDS(ON) of 80 mOhms, and with ID(MAX) at 33 A. The device is packaged in a standard TO-247-3 package.

The material properties of SiCs bring certain benefits. Foremost, an SiC has a much larger bandgap than silicon, hence SiC devices can operate at higher temperatures without suffering from thermally induced intrinsic conduction effects. An SiC device also has a higher breakdown voltage, meaning that devices can support higher voltages for a given device geometry. In addition, an SiC chip has higher thermal conductivity and higher electron drift velocities, enabling higher power and higher speeds.

Since the CMF20120D is the first SiC MOSFET available easily on the open market, we felt that an analysis was warranted. In this brief article, we share some of the highlights of our investigation.

Figure 1 shows a high resolution photograph of the CMF20120D die following decapsulation in Chipworks’ lab. The active region of the die is 3.46 mm x 3.46 mm. There are four wire bonds connecting to the source metallization area, while a fifth wire bond is connected to the gate contact pad on the left side of the die. Some simple measurements show that the source metallization area corresponds to 61% of the die area, while the gate pad and gate interconnect tracks correspond to 11% of the die area. The balance of the area is comprised of the inactive region around the periphery of the die.

Figure 1. CMF20120D Die Photograph

A detailed view of the corner of the source metallization area is shown in Figure 2. Each dark rectangle corresponds to a source contact to the SiC substrate. The contacts are surrounded by the polysilicon gate that lies beneath the metal. Each gate cell is 10 µm x 17.4 µm wide, hence a simple calculation estimates there to be 58,000 gate cells on the die. Consequently, when the device is conducting the highest rated drain current of 33 A, then each cell would carry ~0.6 mA.

Figure 2. CMF20120D Source Metallization Corner and Gate Cell Area

Figure 3 shows a cross section through the edge of the CMF20120D SiC die. The cross section location is shown in Figure 1. The device is a vertical drift MOSFET, hence the source metal and gate array are located on the top side of the 370 µm thick die, while the drain is located at the bottom side.  The operation of a discrete power MOSFET is described on Wikipedia. When the device is off, then the full 1200 V rated voltage will be blocked between the source and drain, however, when the device is on, the source to drain resistance will be 80 mOhms. The switching time, according to the datasheet, is on the order of 30 ns to 80 ns.

Figure 3. CMF20120D Die Cross Section

The top side of the die features the source metal and a poly silicon gate array. Figure 4 shows a cross section through a single cell in the gate array. The transistor is comprised of source contacts to N+ diffusions that lie within the P-body. The N- drift region is formed using a layer of SiC epi plus the full thickness of the die.

Figure 4. CMF20120D MOS Gate Cell Cross Section

A more detailed view of the edge of a MOS gate is shown in Figure 5. The active channel lies between the edge of the N+ diffusion and the N- drift region.

Figure 5. CMF20120D MOS Gate Cell Cross Section Detail

The CMF20120D is the first easily available SiC vertical MOSFET device. This analysis shows that Cree has adopted a very conventional design for this discrete device. The next step will be the development of a SiC power IC that incorporates both control circuitry and power transistors into a single chip.

Related Analysis:

CREE CMF20120D Silicon Carbide Power MOSFET 1200V 80 mΩ Z-FETTM MOSFET N-Channel Enhancement Mode Exploratory Analysis

Efficient Power Conversion EPC1015 Enhancement Mode GaN-on-Silicon Power Transistor Exploratory Analysis

International Rectifier IP2010PBF GaN Integrated Power Stage Process Review Report

ISSCC – Intel’s Ivy Bridge, Rosepoint, Near-Threshold Techniques

February 23rd, 2012 by Dick James

Contributed by Vincent Karam.

Kicking off the afternoon of day 1 was the Ivy Bridge paper (3.1); the processor contains 1.4 Billion Transistors in an area of 160 mm2 (for their 4 core 2 graphic segment die). The IVB dies were shown in four configurations, 4+2 (4 cores 2 graphics), 2+2, 4+1 and 2+1.

Here were some of the chip’s major highlights:

Quad-core with Intel Hyper-threading Technology

Next Generation Intel HD Graphics with DirectX 11 support

Dual channel DDR3-1600 or DDR3L -1333 interface

Integrated PCIe

Support for 3 displays simultaneously

Up to 8 MB cache memory

Same Thermal Design Power as predecessor

Next up was Intel’s 32nm Atom SoC with integrated WiFi codenamed Rosepoint (paper 3.4). Intel says it’s the first 32nm SoC with a WiFi transceiver and two Atom cores on the same die. They were able to get the Atom cores and the WiFi transceiver to get along nicely by choosing Atom processor frequencies such that their harmonics didn’t land in the WiFi frequency band.

Intel announces Atom-based WiFi chip Source: Intel

This was an obvious example of the direction Intel would like to push RF, into a scalable technology that keeps up with Intel’s fabs, so think digital CMOS. For most RF designers, including myself, it’s hard to imagine, but it’s something all RF designers will have to come to grips with.  Over the past few years Intel has been converting traditionally analog blocks to fully digital circuits (LNA ISSCC’01, Synthesizer VLSI’10, T/R Switch ISSCC’11 to name a few). On Tuesday Intel will also be presenting an all digital PA and Phase modulator, so you can add those to the list.

Intel’s third Microprocessor project, code named Claremont, seems to have received more attention by the media for different reasons than intended. This was a 32nm processor that demonstrated NTV (Near Threshold Voltage) operation as a means to optimize computational speed and energy (3.6). Although Intel used a solar cell to power the chip, Intel says they do not have any intention of producing solar powered CPU’s (at least in the near future). Power consumption can be as low as 2 mW, and it can operate on as little as 280 mV up to the conventional 1.2 V.

Intel's Claremont processor using NTV technology Source: Intel

ISSCC – Samsung Presents Dual/Quad-Core 32-nm Exynos Processor

February 23rd, 2012 by Dick James

Contributed by Mike Christie

At ISSCC 2012, Samsung presented (paper 12.1) in the Multimedia and Communication SOCs session, entitled “A 32 nm High-k Metal Gate Application Processor with Ghz Multi-Core CPU.”

In this presentation, Samsung discussed its next generation Exynos application processor – we just recently finished a functional analysis report on the Exynos 4210. Samsung have already announced the Exynos 4212 (dual-core Cortex A9) and Exynos 5250 (dual-core Cortex A15), both of which are 32 nm HKMG.  Presumably, this one will be another in the Exynos series.

The specs on this processor include: two or four ARM-V7A CPU cores, with a shared 1 MB cache memory, each with a full hardware vector floating-point unit and 64 bit ARM NEON single instruction multiple data (SIMD) engine; a GPU containing quad core pixel processors, a single geometry processor, and its own 128 KB of dedicated L2 cache memory; and a dual channel DRAM interface capable of up to 6.4 GB/s and supporting LPDDR2, DDR2, and DDR3 400 MHz.

Block Diagram of Samsung's 32 nm Application Processor (source: Samsung/ISSCC)

The specs themselves are not particularly surprising, but the techniques Samsung has used to increase performance and reduce power consumption stand out.

The first major innovation is the switch from a poly-Si/SiON process to the HKMG process.  Their tests indicate that this process greatly reduces the leakage current in comparison to the old process (100x in gate leakage and 10x in overall leakage) with a 40% improvement in performance.

There are four power domains on the die: CPU, GPU, memory I/F, and media Ips. Each of these is further divided into power subdomains. For example, in the CPU domain, each of the cores is its own power domain, and each half of the cache memory. This allows for various power schemes to be used, depending on the system requirements.

Samsung has introduced a number of methods of balancing power and performance on the die, so that only the hardware needed for an application is used. The first of these is called DVFS, or dynamic voltage frequency scaling. The DVFS unit adjusts the operating voltage and frequency of the active blocks to meet the performance requirements of an application. By doing this, they have improved the battery life (for AP and DRAM only) by 34% to 50%.

The second method of balancing performance and power consumption is by means of body biasing. By using a Forward Body Bias, performance can be increased by as much as 13.5%, and by means of a Reverse Body Bias, it is possible to instead reduce the leakage current on a transistor, thereby reduce the power consumption.

Finally, there is the addition of a thermal management unit (TMU) which monitors the temperature of the system through thermal sensors, and maintains a constant temperature by throttling the various blocks, as necessary, through the DVFS controller. When the temperature in a block is determined to be too high, the performance will be reduced in order to maintain the temperature below a threshold. This not only helps to prevent burnout of the device, but also helps to reduce power consumption by as much as 32%.

Thermal Management Unit in Samsung's Application Processor (source: Samsung/ISSCC)

Samsung did not want to comment on the die size or many details of the process, as it is soon to be released to the press, but they displayed them at the demo sessions, along with their previous 45 nm generation, to show the improvements in performance.